STUDY OF AL-C MULTILAYERS USING ANOMALOUS REFLECTIVITY AND HIGH QUANTUM WELLS USING RESOLUTION DIFFRACTION STUDIES OF MULTILAYERS. M.K. Sanyal¹, A.Datta¹, S. Banerjee¹, B.M. Arora², J. Basu¹, M.R. Mishra¹ , T. Ohkawa³, Y. Yamaguchi³, O. Sakata³ and H. Hashizume³. ¹Saha Institute of Nuclear Physics, Calcutta 700 064, INDIA; ²Tata Institute of Fundamental Research, Bombay 400 005, INDIA; ³Tokyo Institute of Technology, Yokohama 226, JAPAN

We present here the results of structural studies of various multilayers using x-ray scattering techniques. To determine electron density profile of multilayers, we have used a recently developed [1] anomalous reflectivity technique where x-ray reflectivity profiles are measured at and away from the x-ray absorption edge of the substrate and these two profiles provide a model independent electron density profile of the measured sample as a function of depth. Here we present results [2] of our study of Aluminum-Carbon multilayers deposited on Germanium single crystal. The data was taken at Photon Factory synchrotron source, Japan. We also present results of high resolution diffraction measurements of single and double quantum well structures [InGaAs in InP (001) crystal]. The measurements were done at Saha Institute of Nuclear Physics and were prepared at Tata Institute of Fundamental Research, by MOCVD technique. The x-ray measurements were performed in double-crystal x-ray diffraction mode[3] and the data is being analyzed using a model based on Takagi-Taupin theory of dynamical diffraction. These measurements can provide information regarding lattice strain and interfacial structures.

1. M. K. Sanyal et al, Europhys. Lett. 21, 691 (1993);

2. T.Ohkawa et al, Physica B (In Press)

3. C.R.Wie, Mat.Sc.& Engg., R13, 1 (1994)