X-RAY CAPILLARY OPTICS, TEST AND APPLICATIONS ON AN UNDULATOR BEAM LINE AT ESRF. P.Engström, C.Riekel. ESRF, B.P.220, F38043 Grenoble Cedex, France.

With the start of the third generation synchrotron radiation sources for hard X-rays like ESRF, APS and Spring-8 a demand for new types of focusing optics has evolved. One of the possible optics is the X-ray Capillary Optics (XCO) which it is based on a very simple principle of total reflection. By letting the X-ray beam enter the hollow capillary and by multiple reflection being transmitted and at the same time letting the diameter of the hole decrease in size an intensity increase being achieved. In this way beams of 1 um or smaller can be reached. We will present a number of test of XCO on the undulator based micro focus beam line of ESRF under different conditions. We will also show how one can remove a lot of the background for XRD, WAXS and high angle SAXS. We will show a couple of applications in order to illustrate the potential of this optics. We have with this method reached over 10¹⁰ photons/s/um² with 2*10^-4 [[partialdiff]]E/E at about 13 keV.