CHARACTERIZATION OF MULTILAYERS AND THIN FILMS BY HIGH RESOLUTION X-RAY DIFFRACTION AND X-RAY STANDING WAVES Mikhail Kovalchuk, Svetlana Zheludeva, X-Ray Optics and Synchrotron Radiation Laboratory, A.V.Shubnikov Institute of Crystallography Russian Academy of Sciences, Leninsky pr.59, Moscow 117333, Russia.

X-Ray Standing Waves (XSW) method (see f.e. [1]) is based on the combination of high structural sensitivity of classical X-Ray diffraction method and spectroscopic selectivity under non-elastic secondary radiation measurements (photoelectrons, fluorescence, etc.). Surface-sensitivity of XSW is determined either by very small escape depth of secondary radiation and/or very small penetration depth for incident X-Ray under Total External Reflection conditions.

Present paper demonstrates unique possibilities of various modifications of XSW [2-4] for characterization of ultra-thin (crystalline and amorphous, inorganic and organic) layers, multi-layers systems and superlattices available due to the achievements of nanotechnology which allows to manipulate with ultra-thin layers constructing on their base absolutely new nanometer-scale materials (wave-guide structures and multilayers) and devices.

Different non-traditional ways in order to generate XSW (various kinds of secondary radiations and various types of interference phenomena) with period in the range: 0.1 -1000 are discussed.

[1] M.V. Kovalchuk, V.G. Kohn. Sov.Phys.Usp. 29, (1986), 426.

[2] M.V.Kovalchuk, A.Yu.Kazimirov, S.I.Zheludeva. Nucl.Instrum. and Methods B 101, (1995), 435-452.

[3] M.V.Kovalchuk, S.I.Zheludeva. Journal de Physique IV, Collogue C9, Suppl. au Journal de Physique III, Vol.4, November 1994, C9-431.

[4] S.I.Zheludeva, M.V.Kovalchuk, N.N.Novikova, A.N.Sosfenov. Advances in X-Ray chemical analysis, 26S(1995), 181.