Combined Analysis using X-ray Scattering

Quickly, the Combined Analysis methodology is an approach allowing to extract as maximum information as possible from scattering patterns [preferred orientations (ODF, pole figures), residual stresses (homogeneisation models of elastic tensors), microstructures (iso- anisotropic sizes, microstrains, distributions, faults), phase analysis (crystalline or mixtures of crystallines/amorphous), structures, thickness and roughness (specular reflectivity)], x-ray fluorescence. It allows individual algorithms to interact with each others to reach a global minimum for simultaneously all the refined parameters. The Rietveld method serves the core of the methodology, and all is integrated in the user-friendly software MAUD. Each analysis type will be first described, then integrated in the combined approach, and each day of the workshop will be dedicated to one or two characterisation type (texture, reflectivity ...) and to its practice. Mornings will consist of courses, afternoons of practical training on your own computers. All the materials will be downloadable prior to the workshop.Â
People working on real materials (time-consuming or hard to elaborate, rare, subjected to change under grinding or impossible to grind, films or multilayers, ...), are a priori interested by this workshop. Personal examples can be brought to Caen, might be measured before or during the workshop.