X-ray diffraction imaging of metal-oxide epitaxial tunnel junctions made by optical lithography: use of focused and unfocused X-ray beams

J. Synchrotron Rad. (2013). 20, 355-365 (http://doi.org/ksp)

Schematics of the X-ray diffraction imaging experiment and the model sample used (epitaxial magnetic tunnel junction).

Metal-oxide magnetic tunnel junctions, consisting of an insulating layer sandwiched between two electrodes made of hard and soft ferromagnetic layered materials, are highly sensitive sensors for spintronic applications. Typical sizes in the micrometre range favored investigations using X-ray imaging techniques. The layers, differing either by their lattice parameter or by crystalline structure, were easily distinguishable from each other by X-ray diffraction contrast, while raster imaging and local probe diffraction allowed defects and distortions at both the macro- and the microscale to be detected and localized.