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Chemically selective soft X-ray patterning of polymers

J. Synchrotron Rad. (2007). 14, 181–190 [doi:10.1107/S0909049506053829]

[X-ray polymer patterning]
Using monochromated soft X-rays and a two-layer polymer structure, Wang et al. have demonstrated chemically selective patterning using the high brightness, fine focused, 50 nm beam of the polymer scanning transmission X-ray microscope (STXM) at the Advanced Light Source. Writing and reading at strong absorption lines was used to make and image patterns independently in polymethylmethacrylate (288.4 eV) and polyacrylonitrile (286.8 eV) layers using STXM. Examples include (a) the logo of Lawrence Berkeley National Lab, (b) the logo of the Canadian Light Source (PMMA = red, PAN = blue) and (c) ‘Smokie’ (PMMA = brown, PAN = grey); (d) input. Scale bar = 1 micron.
J. Wang, H.D.H. Stöver, A.P. Hitchcock and T. Tyliszczak